Imec demonstrates electrical yield for 20nm lines High NA EUV single patterning(imec-int.com) LEUVEN (Belgium), February 24, 2025— This week at SPIE Advanced Lithography + Patterning, imec, a world-leading research and innovation hub in nanoelectronics and digital technologies, presents the first electrical test (e-test) results obtained on 20nm pitch metal line structures patterned after single-exposure High NA EUV lithography.
TSMC cannot make 2nm chips abroad now: MOEA(taipeitimes.com) Taiwan’s technology protection rules prohibits Taiwan Semiconductor Manufacturing Co (TSMC, 台積電) from producing 2-nanometer chips abroad, so the company must keep its most cutting-edge technology at home, Minister of Economic Affairs J.W. Kuo (郭智輝) said yesterday.