Former ASML head scientist Lin Nan drives China's latest EUV breakthrough
(scmp.com)
Chinese researchers have cracked a barrier to the home-grown production of advanced chips by building an extreme ultraviolet (EUV) light source platform that operates at internationally competitive parameters, according to a research paper.
Chinese researchers have cracked a barrier to the home-grown production of advanced chips by building an extreme ultraviolet (EUV) light source platform that operates at internationally competitive parameters, according to a research paper.